Research in photolithography within the Polymer Chemistry Group arose from many years of work studying the effects of high-energy radiation on polymeric materials.

This knowledge has become more important as the energy of the incident photons used in processing integrated circuits increases. Initial work on degradation of pellicles has moved into synthesis of polymeric resists with high refractive indices, and of novel resists for non-chemically amplified lithography.

In recent work the group has been concentrating on finding innovative ways of minimising line edge roughness in patterned wafers.